The Microfabrication Lab at Wilkes University, located in the Stark Learning Center, is a state-of-the-art facility dedicated to the advancement of micro and nanoscale technologies. This lab specializes in the fabrication and characterization of advanced devices, including sensors for biomedical and environmental applications, MEMS (Micro-Electro-Mechanical Systems), and semiconductors.
As part of a $6 million RACP-funded renovation, the lab features cutting-edge equipment such as a sputtering system with dual DC and RF sputtering guns, an electron beam evaporation system, an MJB3 mask aligner, reactive ion etchers, and a Bruce Technologies Model 7351C Semiconductor Process Controller with a four-tube Tempress stack for silicon wafer oxidation and doping. These resources provide students with hands-on experience in modern semiconductor fabrication processes, including wafer characterization, lithography, etching, pattern transfer, and electrical testing.
The lab supports both education and research, offering integrated learning opportunities in areas such as semiconductor fabrication, MEMS, and device characterization. Students use advanced tools like wet benches for batch cleaning, spin-rinse dryers, photolithography systems, and probe stations for device characterization. Simulation software, including Silvaco Athena and Atlas, complements hands-on activities by enabling process and device simulation.
By focusing on real-world applications, the lab equips students to excel in high-demand fields like sustainable energy, biomedical devices, and advanced materials, while fostering innovation and collaboration with industry leaders.
Lab Capabilities – Process Tools
- Wet Bench with hot plates for batch cleaning, etching, and resist removal; Ultra Sonics Bath (Table top); Millipore Super Q Water Polishing System; March CS-1701 Reactive Ion
- Etcher; Batch spin, rinse, dryers: 4” – Semitool single Stack SRD and 30 mm – Fluoroware.
- Karl Suss MJB-3 Mask Aligner and manual Unitron mask alignment microscope with split field objectives Pattern transfer tools; Headway Research Model PWM 32 Photo Resist Spinner; various ovens and inspection microscope, Bruce Technologies Model 7351C Semiconductor Process Controller, Tempress 4 tube stack for four inch wafers suitable for oxidation and doping of silicon wafers.
Metrology Tools
- Four point probe to monitor doping with measured sheet resistance.
- Hot point probe
- RCA film thickness monitor
- Probe stations and Tektronix 370 Curve Tracer used for diode & transistor characterization.
- Angle lap-stain junction depth
Simulation Software
Silvaco: Athena for process simulation, Atlas for device characteristics